| タイトル | RFマグネトロンスパッタ法により製作したMgO薄膜の結晶性に及ぼす基板温度の影響: 材料分析室利用研究成果、そのXXIX(2) |
| その他のタイトル | Effect of substrate temperature on the crystalline of MgO thin films by RF magnetron sputtering: Research works accomplished by using materials a analysis facilities: XXIX(2) |
| 参考URL | http://hdl.handle.net/10368/32000 |
| 著者（日） | 後藤, みき; 今井, 雄貴; 光高, 諒; 中山, 玄; 三栖, 貴行; 荒井, 俊彦 |
| 著者（英） | Goto, Miki; Imai, Yuki; Mitsutaka, Ryo; Nakayama, Hikaru; Misu, Takayuki; Arai, Toshihiko |
| 著者所属（日） | 神奈川工科大学; 神奈川工科大学; 神奈川工科大学; 神奈川工科大学; 神奈川工科大学; 神奈川工科大学 |
| 著者所属（英） | Kanagawa Institute of Technology; Kanagawa Institute of Technology; Kanagawa Institute of Technology; Kanagawa Institute of Technology; Kanagawa Institute of Technology; Kanagawa Institute of Technology |
| 発行日 | 2019-03-01 |
| 発行機関など | 神奈川工科大学
Kanagawa Institute of Technology |
| 刊行物名 | 神奈川工科大学研究報告: B理工学編
Research Reports of Kanagawa Institute of Technology: Part B. Science and Technology |
| 号 | 43 |
| 開始ページ | 17 |
| 終了ページ | 20 |
| 刊行年月日 | 2019-03-01 |
| 言語 | jpn
eng |
| 抄録 | Magnesium oxide (MgO) thin films are great concern as electrode protection layer with very high secondary emission coefficient (γ) in the application such as plasma display panel (PDP). We have studied the effect of the substrate temperature on the crystalline structure and the secondary emission coefficient γ of MgO films. The MgO thin films have been fabricated by RF magnetron sputtering technique with various substrate temperatures of growth parameters. The secondary emission coefficient γ were estimated the breakdown voltage in Ne gas. The crystalline structure of the films was confirmed by X-ray diffraction (XRD) analysis. As a result, the preferred orientation of MgO thin films was observed in the [200] plane at substrate temperature between room temperature and 700 C. For temperatures above 500 C, [111] plane peak was observed. The secondary emission coefficient γ had a maximum at the substrate temperature of about 500 C. |
| 内容記述 | 形態: カラー図版あり
Physical characteristics: Original contains color illustrations |
| キーワード | MgO thin films; substrate temperature; RF magnetron sputtering; XRD; secondary emission coefficient γ |
| 資料種別 | Departmental Bulletin Paper |
| NASA分類 | Engineering (General) |
| ISSN | 2188-2878 |
| NCID | AA12669200 |
| SHI-NO | AA1940056000 |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/924292 |
