| タイトル | Radiation Damage Effects in Far Ultraviolet Filters and Substrates |
| 本文（外部サイト） | http://hdl.handle.net/2060/19980202392 |
| 著者（英） | Zukic, Muamer; Keffer, Charles E.; Torr, Douglas G.; Torr, Marsha R.; Spann, James F.; Kim, Jongmin |
| 著者所属（英） | NASA Marshall Space Flight Center |
| 発行日 | 1993-01-01
1993 |
| 言語 | eng |
| 内容記述 | New advances in VUV thin film filter technology have been made using filter designs with multilayers of materials such as Al2O3, BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2. Our immediate application for these filters will be in an imaging system to be flown on a satellite where a 2 X 9 R(sub E) orbit will expose the instrument to approximately 275 krads of radiation. In view of the fact that no previous studies have been made on potential radiation damage of these materials in the thin film format, we report on such an assessment here. Transmittances and reflectances of BaF2, CaF2, HfO2, LaF3, MgF2, and SiO2 thin films on MgF2 substrates, Al2O3 thin films on fused silica substrates, uncoated fused silica and MgF2, and four multilayer filters made from these materials were measured from 120 nm to 180 nm before and after irradiation by 250 krads from a Co-60 gamma radiation source. No radiation-induced losses in transmittance or reflectance occurred in this wavelength range. Additional postradiation measurements from 160 nm to 300 nm indicated a 3 - 5% radiation-induced absorption near 260 nm in some of the samples with MgF2 substrates. From these measurements it is concluded that far ultraviolet filters made from the materials tested should experience less that 5% change from exposure to up to 250 krads of high energy radiation in space applications. |
| NASA分類 | Optics |
| レポートNO | NASA-TM-113080
NAS 1.15:113080 |
| 権利 | No Copyright |
| URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/98725 |
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