タイトル | Enhance refractive index modification of fused silica by multiwavelength excitation process using F2 and K[lc]rF excimer lasers |
その他のタイトル | F2およびKrFエキシマレーザを用いる多波長励起過程による溶融シリカの屈折率改変の増強 |
著者(日) | 小幡 孝太郎; 杉岡 幸次; 豊田 浩一; 緑川 克美 |
著者(英) | Obata, Kotaro; Sugioka, Koji; Toyoda, Koichi; Midorikawa, Katsumi |
著者所属(日) | 東京理科大学 基礎工学部 電子応用工学科; 理化学研究所 レーザー物理工学研究室; 東京理科大学 基礎工学部 電子応用工学科; 理化学研究所 レーザー物理工学研究室 |
著者所属(英) | Tokyo University of Science Department of Applied Electronics, Faculty of Industrial Science and Technology; Institute of Physical and Chemical Research Laser Technology Laboratory; Tokyo University of Science Department of Applied Electronics, Faculty of Industrial Science and Technology; Institute of Physical and Chemical Research Laser Technology Laboratory |
発行日 | 2003-01 |
発行機関など | Institute of Physical and Chemical Research |
刊行物名 | RIKEN Review RIKEN Review |
号 | 50 |
開始ページ | 42 |
終了ページ | 46 |
刊行年月日 | 2003-01 |
言語 | eng |
抄録 | A multiwavelength excitation process using F2 and KrF excimer lasers for the high-efficiency and high-speed refractive index modification of fused silica is demonstrated. This process is essentially superior to conventional single-wavelength F2 laser processing. The former process achieves twice the diffraction efficiency of the latter process at the same number of total photons supplied to the sample. This high-speed and high-efficiency modification is realized within +/- 50 ns of the delay time of each F2 and KrF excimer laser beam irradiation. In addition, the refractive index of the multiwavelength sample was increased to 8.2 x 10(exp -3) which is 1.78 times larger than that of the single-wavelength F2 laser irradiation sample at the same irradiation time. This superiority of the multiwavelength excitation process is attributed to a resonance-photoionization-like process based on excited-state absorption in fused silica. |
キーワード | F2 laser; KrF laser; excimer laser; refractive index; fused silica; laser processing; multiwavelength excitation; optoelectronic device; F2レーザ; KrFレーザ; エキシマレーザ; 屈折率; 溶融シリカ; レーザ処理; 多波長励起; オプトエレクトロニクス装置 |
資料種別 | Conference Paper |
ISSN | 0919-3405 |
SHI-NO | AA0045001007 |
URI | https://repository.exst.jaxa.jp/dspace/handle/a-is/42652 |